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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Eliminating the surface inversion layer under the field oxide by low pressure rapid thermal annealing
Details
Eliminating the surface inversion layer under the field oxide by low pressure rapid thermal annealing
Journal
Journal of the Electrochemical Society
Journal Volume
141
Journal Issue
9
Pages
2498-2502
Date Issued
1994
Author(s)
JENN-GWO HWU
DOI
10.1149/1.2055150
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-0028497229&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/307553
Type
journal article