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College of Electrical Engineering and Computer Science / 電機資訊學院
Electronics Engineering / 電子工程學研究所
Simultaneous layout migration and decomposition for double patterning technology
Details
Simultaneous layout migration and decomposition for double patterning technology
Journal
IEEE/ACM International Conference on Computer-Aided Design
Pages
595-600
Date Issued
2009
Author(s)
Hsu, C.-H.
Chang, Y.-W.
Nassif, S.R.
YAO-WEN CHANG
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-76349103032&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/350353
Type
conference paper