Robust operation of copper chemical mechanical polishing

Resource

Microelectronic Engineering 65 (1-2): 61-75

Journal

Microelectronic Engineering

Journal Issue

65

Pages

61-75

Date Issued

2003

Date

2003

Author(s)

Kao, Yi-Chung

Yu, Cheng-Ching

Shen, Shih-Haur

URI

Type

journal article

File(s)

Name

33.pdf

Size

843.11 KB

Format

Adobe PDF

Checksum

(MD5):ac8219aa5273fa3bca13eafa62a7e7d0