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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
The influence of oxygen flow ratio on the optoelectronic properties of p-type Ni1-xO films deposited by ion beam assisted sputtering
Details
The influence of oxygen flow ratio on the optoelectronic properties of p-type Ni1-xO films deposited by ion beam assisted sputtering
Journal
Coatings
Journal Volume
8
Journal Issue
5
Date Issued
2018
Author(s)
Sun, H.
Chen, S.-C.
Peng, W.-C.
Wen, C.-K.
Wang, X.
Chuang, T.-H.
TUNG-HAN CHUANG
DOI
10.3390/coatings8050168
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491954
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85051588949&doi=10.3390%2fcoatings8050168&partnerID=40&md5=cbaf69791deca5ef5a938a76a29817eb
Type
journal article