Cavitation-resistant TiNi films deposited by using cathodic arc plasma ion plating

Journal

Wear

Journal Volume

233-235

Pages

104-110

Date Issued

1999

Author(s)

He J.L.

Won K.W.

Chang C.T.

Chen K.C.

Lin H.C.

DOI

10.1016/S0043-1648(99)00202-1

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033368172&doi=10.1016%2fS0043-1648%2899%2900202-1&partnerID=40&md5=26ef1748dbcb62ca8ce72a43fad464c4

https://scholars.lib.ntu.edu.tw/handle/123456789/432528

Publisher

Elsevier Sequoia SA, Lausanne, Switzerland

Type

conference paper