Dry Etching of Si Field Emitters and High Aspect Ratio Resonators Using an Inductively Coupled Plasma Source

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

16

Journal Issue

5

Pages

2849-2854

Date Issued

1998-09

Author(s)

M. R. Rakhsh

ehroo

J. W. Weigold

W. -C. Tian

S. W. Pang

WEI-CHENG TIAN

DOI

URI

Type

journal article