Novel Method for in situ Monitoring of Thickness of Quartz during Wet Etching

Resource

Japanese Journal of Applied Physics 44 (10): 7662-7666

Journal

Japanese Journal of Applied Physics

Journal Volume

44

Journal Issue

10

Pages

7662-7666

Date Issued

2005

Date

2005

Author(s)

Lee, Chi-Yuan

Chen, Yung-Yu

Dai, Ching-Liang

Chen, Ping-Hei

DOI

URI

File(s)

Name

15.pdf

Size

147.68 KB

Format

Adobe PDF

Checksum

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