Attainment of nearly thermally limited subthreshold slope in GaAs MOSFETs with in-situ Y2O3gate dielectric for cryogenic electronics
Journal
2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT)
Journal Volume
31
Start Page
189083
ISBN (of the container)
979-835033416-6
Date Issued
2023-04-17
Author(s)
Abstract
We have achieved subthreshold slope (SS) values close to the thermal limited values in GaAs metal-oxide-semiconductor field-effect transistors (MOSFETs). The low interfacial trap density (Dit) at the in-situ prepared Y2O3/GaAs(001) has attributed to these low SS values of 63 mV/dec at 300 K and 18 mV/dec at 77 K, respectively. The SS value of our GaAs MOSFETs at 77 K is comparable to those of the SiO2/Si MOSFETs at 77 K and InGaAs high-electron-mobility transistors (HEMTs) at 5K, suggesting the GaAs MOSFETs for cryogenic low-power application.
Publisher
IEEE
Type
conference paper