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  4. Studies on Black Matrix Composite of Color Filter
 
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Studies on Black Matrix Composite of Color Filter

Date Issued
2006
Date
2006
Author(s)
Hsu, Chuan-Hao
DOI
zh-TW
URI
http://ntur.lib.ntu.edu.tw//handle/246246/62890
Abstract
The synthesis of alkali soluble UV-curable resins with carboxyl group had been fully-developed in this study. After well-mixed with carbon black, the ultra-thin pattern with optical density up to 4.0 could be obtained via the lithography process. There were two types of the UV-curable resins. One was the polymeric type UV-curable resin. The copolymer (poly(acrylic acid)-co-(benzyl methacrylate)-co-(2-hydroxyethyl acrylate)) was reacted with the oligomer, which was pre-synthesized by toluene 2,4-diisocyanate(TDI) and 2-hydroxyethyl methacrylate(HEMA) and hence the polymeric type UV-curable resin was formed. Another one was the modified epoxy acrylate type UV-curable resin. The prepolymer synthesized by the ring-opening reaction of maleic anhydride and acidification epoxy acrylate was reacted with the oligomer, which was pre-synthesized by isophorone diisocyanate(IPDI) and 2-hydroxyethyl methacrylate(HEMA) to form the modified epoxy acrylate type UV-curable resin. The Fourier transfer infrared spectrometer and nuclear magnetic resonance were utilized to monitor and identify the functional groups of the synthesized resins. And the gel permeation chromatography was used to analyze the molecular weight of the UV-curable resins. The PH meter was utilized to evaluate the acid value of resins. The photo-resist was prepared by mixing up carbon black, resin, polymeric dispersants, propylene glycol monomethyl ether acetate(PGMEA), photo initiator and leveling agent, and followed by the ball mixing process with Zirconium oxide beads. A dynamic light scattering analyzer and transmission electron microscope was utilized to analyze the distribution of carbon black. As a result the narrow size distribution of carbon black between 50~150nm can be obtained. The UV-curable resist was spin-coated on the glass substrate to form a thin film. After pre-baking and lithography technique, the patterns with line-width 100μm can be achieved. An optical microscope and scanning electron microscope were utilized to observe the morphology and the thickness of this thin film. The thermal property of this thin film was studied by a thermogravimetric analyzer. As a result, the ultra-thin film with 1μm thickness and optical density up to 4.0 can be obtained.
Subjects
鹼可洗紫外光可硬化樹脂
碳黑
分散
黑色矩陣
微影製程
光學密度值
Alkali soluble UV-curable resin
Carbon black
Dispersion
Black matrix
Lithography
Optical density
Type
thesis
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