Novel Method for In-situ Monitoring of Thickness of Quartz during Wet Etching
Resource
Japanese Journal of Applied Physics,44(10),7262-7264.
Journal
Japanese Journal of Applied Physics
Journal Volume
44
Journal Issue
10
Pages
7262-7264
Date Issued
2005-10
Date
2005-10
Author(s)
Lee, C. Y.
Cheng, Y. C.
Wu, T. T.
Chen, Y. Y.
Chen, W. J.
Pao, S. Y.
Chang, P. Z.
Chen, Ping Hei
Type
journal article