Simultaneously determining Young's modulus, coefficient of thermal expansion, Poisson ratio and thickness of thin films on silicon wafer
Resource
Electronic Components and Technology Conference, 2004. Proceedings. 54th
Journal
Electronic Components and Technology Conference, 2004. Proceedings. 54th
Pages
-
Date Issued
2004-06
Date
2004-06
Author(s)
Wu, Enboa
Yang, A.J.D.
Shao, Ching-An
DOI
N/A
Abstract
A method is demonstrated to simultaneously determine Young's modulus (E), coefficient of thermal expansion (/spl alpha/), Poisson ratio (v), and thickness (t) of thin films on a silicon wafer. A digital phase-shifted reflection moire (DPRM) technique was adopted to record the warpage slope of the film/wafer composites under temperature change. These data were used to compare with the ANSYS analysis, and a genetic algorithm (GA) was employed to search for the optimal mechanical parameters of the films. In the first experiment, 1.20-/spl mu/m thick copper was sputtered on a 4-inch silicon wafer. While the determined film thickness was in good agreement with the measured value, the deviation in E, /spl alpha/ and v was significant. The micro-structural difference between the bulk material and the thin film, and oxidation on the film surface were considered to be the two major causes to this deviation. In order to verify the determined mechanical parameters of this 1.2-/spl mu/m Cu film, an additional 2.4-/spl mu/m Cu film was sputtered on the Cu/Si wafer and the determined mechanical parameters of this additional Cu film were identical to the data obtained in the 1.2-/spl mu/m film, which demonstrated the validity of the developed method.
Type
other
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