Enhanced Extreme Ultraviolet Lithography Mask Inspection Contrast Using Fabry-Perot Type Antireflective Coating

Resource

Japanese Journal of Applied Physics 43 (6B): 3703-3706

Journal

Japanese Journal of Applied Physics

Journal Issue

43

Pages

3703-3706

Date Issued

2004

Date

2004

Author(s)

Cheng, Hsu-Chun

Ko, Tsung-Shine

Lai, Lee-Jene

Ko, Fu-Hsiang

Chu, Tieh-Chi

URI

Type

journal article

File(s)

Name

10.pdf

Size

131.46 KB

Format

Adobe PDF

Checksum

(MD5):104f134646880efb72279a95d98e294e