Modeling the defect inspection sensitivity of a confocal microscope

Resource

Microlithography 2005 -- Proc. SPIE Vol. 5751, p. 1223-1229, Emerging Lithographic Technologies IX; May 2005, San Jose, California, USA(2005.03)

Journal

Microlithography 2005 - Proc. SPIE Vol. 5751, Emerging Lithographic Technologies IX

Pages

1223-1229

Date Issued

2005-03

Author(s)

Eric M. Gullikson

Edita Tejnil

Kuen-Yu Tsai

Alan R. Stivers

H. Kusunose

DOI

URI

Type

conference paper