DSA-compliant routing for two-dimensional patterns using block copolymer lithography

Journal

IEEE/ACM International Conference on Computer-Aided Design

Journal Volume

07-10-November-2016

Date Issued

2016

Author(s)

Su, Y.-H.

DOI

10.1145/2966986.2967025

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85000963090&doi=10.1145%2f2966986.2967025&partnerID=40&md5=134259ca91993112b1061d690e61e9f4

https://scholars.lib.ntu.edu.tw/handle/123456789/405645

Type

conference paper