Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric

Journal

Semiconductor Science and Technology

Journal Volume

21

Journal Issue

5

Pages

665-669

Date Issued

2006

Author(s)

Yeo, C.C.

Cho, B.J.

Lee, M.H.

Liu, C.W.

Choi, K.J.

Lee, T.W.

DOI

10.1088/0268-1242/21/5/017

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/502104

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-33645686127&doi=10.1088%2f0268-1242%2f21%2f5%2f017&partnerID=40&md5=ff3a4d9330d037417c39b9c856a4a4ef

Type

journal article