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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Multiple patterning layout compliance with minimizing topology disturbance and polygon displacement
Details
Multiple patterning layout compliance with minimizing topology disturbance and polygon displacement
Journal
28th ACM International Symposium on Physical Design (ISPD-2019)
Journal Volume
147280
Date Issued
2019
Author(s)
Hua-Yu Chang
Iris Hui-Ru Jiang
HUI-RU JIANG
江蕙如
DOI
10.1145/3299902.3309755
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/427637
Type
conference paper
