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College of Science / 理學院
Applied Physics / 應用物理研究所
MBE-grown high $κ$ gate dielectrics of HfO 2 and (Hf-Al) O 2 for Si and III-V semiconductors nano-electronics
Details
MBE-grown high $κ$ gate dielectrics of HfO 2 and (Hf-Al) O 2 for Si and III-V semiconductors nano-electronics
Journal
Journal of Crystal Growth
Journal Volume
278
Journal Issue
1
Pages
619-623
Date Issued
2005
Author(s)
Lee, WC
MINGHWEI HONG et al.
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/315733
Type
journal article
