Oxidation behavior of Ti-50Al intermetallics with thin TiAl3 film at 1000°C
Journal
Oxidation of Metals
Journal Volume
63
Journal Issue
1-2
Pages
1-13
Date Issued
2005
Author(s)
Abstract
Isothermal oxidation tests at 1000°C in air indicate that the Ti-50Al alloy with about 8 μm TiAl3 layer on the surface can resist the oxidation for 10 hr. From the FESEM and EPMA/EDS results, the rapid oxidation behavior is attributed to the formation of oxide nodules through the protective Al2O3 and TiAl2 layers on the outer surface. Upon increasing the oxidation time at 1000°C, the size and the number of oxide nodules increase. After 3 hr of oxidation at 1000°C, a laminated layer is formed in between the oxide nodule and substrate, which consists of two nearly parallel phases. The EDS results suggest that these two phases are Ti-Al-O compounds. After 20 hr oxidation, the oxidation nodules and laminated layers disappear and a complex oxide scale is formed which is similar to the bare Ti-50 Al oxidized at 1000°C.
SDGs
Type
journal article