Generally applicable self-masking technique for nanotips array fabrication
Journal
International Journal of Nanoscience
Journal Volume
4
Journal Issue
5-6
Pages
879-886
Date Issued
2005-10
Author(s)
Kuei-Hsien Chen
Chih-Hsun Hsu
Hung-Chun Lo
Surojit Chattopadhyay
Chien Ting Wu
Jih-Shang Hwang
Abstract
Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si , poly silicon, GaN , GaP , sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide ( SiC ) protecting caps are attributed to the nanotip formation. The ultra-low turn-on field for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.
Type
journal article