Sliding Mode Control of a Multi-Axes Piezoelectric Positioning Stage Based on Hysteresis Model

E-beam lithography(EBL) is one of the lithographic technique, and it is considered the most potential technique to be the key of semiconductor process in the next generation. Thus, high performance stage is necessary. In this thesis we design a precision six degree-of-freedom positioning stage and control the motion of stage as lithographic compensation.e choose piezoelectric material as the actuator, but the hysteresis cause large displacement error. We use sliding mode controller as the closed loop control to reduce hysteresis effect, because it has robust character. Here hysteresis effect regards as matched system uncertainty, and we can estimate its upper bound by transfer function hysteresis model and Matlab simulation. Therefore, our multi-axes piezoelectric positioning stage could adapt to altering frequency or unsettled amplitude.