Ink-jet patterning of graphene by cap assisted barrier-guided CVD
Journal
RSC Advances
Journal Volume
9
Journal Issue
50
Pages
29105-29108
Date Issued
2019
Author(s)
Chen D.-R., Chiu S.-K., Wu M.-P., Hsu C.-C., Ting C.-C., Hofmann M., Hsieh Y.-P.
Abstract
Barrier-guided CVD growth could provide a new route to printed electronics by combining high quality 2D materials synthesis with scalable and cost-effective deposition methods. Unfortunately, we observe the limited stability of the barrier at growth conditions which results in its removal within minutes due to hydrogen etching. This work describes a route towards enhancing the stability of an ink-jet deposited barrier for high resolution patterning of high quality graphene. By modifying the etching kinetics under confinement, the barrier film could be stabilized and high resolution barriers could be retained even after 6 hours of graphene growth. Thus produced microscopic graphene devices exhibited an increase in conductivity by 6 orders of magnitude and a decrease in defectiveness by 48 times yielding performances that are superior to devices produced by traditional lithographical patterning which indicates the potential of our approach for future electronic applications. ? The Royal Society of Chemistry.
Subjects
Chemical vapor deposition; Cost effectiveness; Etching; Graphene devices; Growth kinetics; Ink; Deposition methods; Electronic application; Growth conditions; High-resolution patterning; Hydrogen etching; Materials synthesis; Orders of magnitude; Printed electronics; Graphene
Other Subjects
Chemical vapor deposition; Cost effectiveness; Etching; Graphene devices; Growth kinetics; Ink; Deposition methods; Electronic application; Growth conditions; High-resolution patterning; Hydrogen etching; Materials synthesis; Orders of magnitude; Printed electronics; Graphene
Type
journal article