Fabrication of subwavelength dual structures on silicon substrates with anti-reflection and low sliding angles
Date Issued
2010
Date
2010
Author(s)
Chiang, Chiao-Hsiu
Abstract
For various optical applications such as anti-reflection surfaces on solar cells, self-cleaning property is potentially required. The self-cleaning property is related to low sliding angle.
From previously published paper, some kinds of nano structures were fabricated to have anti-reflection and low sliding angle. However, these structures which possess both properties usually had high aspect ratios.
It was found that the nano structure on the surface of cicada wing possessed both properties simultaneously and has low aspect ratio. Some of the structures were found to be dual structures. We introduce a new method to fabricate this kind of dual structure. By using two-beam interference lithography and dry etching processes, the nano dual structures have been fabricated. The reflectance, contact angle, and sliding angle of the nano dual structures were measured by our home made reflectometer, contact angle analyzer, and sliding angle analyzer.
Subjects
two-beam interference lithography
anti-reflection
hydrophobicity
dry dtching
nano dual structure
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