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College of Science / 理學院
Chemistry / 化學系
New CVD precursors capable of depositing copper metal under mixed O 2/Ar atmosphere
Details
New CVD precursors capable of depositing copper metal under mixed O 2/Ar atmosphere
Journal
Inorganic Chemistry
Journal Volume
44
Journal Issue
20
Pages
7226-7233
Date Issued
2005
Author(s)
Lay, E.
Song, Y.-H.
Chiu, Y.-C.
Lin, Y.-M.
Chi, Y.
Carty, A.J.
SHIE-MING PENG
Lee, G.-H.
DOI
10.1021/ic050845h
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-26944492131&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/315173
SDGs
[SDGs]SDG6
Type
journal article