HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications

Resource

Japanese Journal of Applied Physics 45: 1803-1807

Journal

Japanese Journal of Applied

Pages

Physic-s

Date Issued

2007

Date

2007

Author(s)

Maikap, S.

Tzeng, P. J.

Wang, T. Y.

Lee, H. Y.

Lin, C. H.

Wang,? C. C.

Lee, L. S.

Yang, J. R.

Tsai, M. J.

URI

Type

journal article

File(s)

Name

8.pdf

Size

196.6 KB

Format

Adobe PDF

Checksum

(MD5):8103aadec078e4e74f3d355386689fe2