Optical properties of n-type porous silicon obtained by photoelectrochemical etching
Journal
Solid State Communications
Journal Volume
111
Journal Issue
12
Pages
681-685
Date Issued
1999
Author(s)
Abstract
The optical studies of n-type porous silicon prepared by the photo-assisted chemical etching are reported here. The optical properties of samples obtained under different conditions have been investigated by photoluminescence and Fourier transform infrared absorption measurements, and they are compared with that of p-type porous silicon. Our results clearly demonstrate that the blue emission in porous silicon originates from surface compounds. From the infrared absorption measurement, we point out that the surface compounds are Si-OH complexes. This conclusion is further supported by a recent calculation which shows that Si-OH complexes can emit the photon energy in the range observed here. We show that the optical properties of the n-type porous silicon are more stable than that of the p-type porous silicon. The result provides the evidence to support the fact that the n-type porous silicon is a better candidate for the application in optoelectronics.
SDGs
Type
journal article