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  4. WiT: Optimal wiring topology for electromigration avoidance
 
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WiT: Optimal wiring topology for electromigration avoidance

Journal
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Journal Volume
20
Journal Issue
4
Pages
581-592
Date Issued
2012
Author(s)
Chang, H.-Y.
Chang, C.-L.
HUI-RU JIANG  
DOI
10.1109/TVLSI.2011.2116049
URI
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84859003368&doi=10.1109%2fTVLSI.2011.2116049&partnerID=40&md5=acac2345dc699ba0fa0f896ce2393b8d
Abstract
Due to excessive current densities, electromigration (EM) may trigger a permanent open- or short-circuit failure in signal wires or power networks in analog or mixed-signal circuits. As the feature size keeps shrinking, this effect becomes a key reliability concern. Hence, in this paper, we focus on wiring topology generation for avoiding EM at the routing stage. Prior works tended towards heuristics; on the contrary, we first claim this problem belongs to class P instead of class NP-hard. Our breakthrough is, via the proof of the greedy-choice property, we successfully model this problem on a multi-source multi-sink flow network and then solve it by a strongly polynomial time algorithm. Experimental results prove the effectiveness and efficiency of our algorithm. © 2006 IEEE.
Subjects
Algorithms; electromigration (EM); global routing; integrated circuit reliability; linear programming
Type
conference paper

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