Design, Fabrication, and Measurement of Single Layer Dielectric Subwavelength Polarizing Beam Splitter
Date Issued
2007
Date
2007
Author(s)
Chou, Kuan-Wen
DOI
en-US
Abstract
Abstract
In the literature, one dimensional subwavelength gratings have been proved to be able to separate light with different polarization. In most cases, to design a dielectric subwavelength grating polarizing beam splitter requires multilayer structure to improve diffraction efficiency. Here, we design a new structure utilizing single layer dielectric subwavelength grating for polarization beam splitting around wavelength of 1.55μm. It also has potential in fiber communication or hybrid optical elements.
For such a polarization beam splitter, we use rigorous coupled wave analysis to design this structure and refer to related works to adjust its parameters. The simulation result shows it has polarizing-beam-splitting capability around wavelength of 1.55μm.
In the fabrication of this polarization beam splitter, we use interference lithography to define photoresist pattern, followed by lift off to transfer pattern into Cr as a metal mask and then followed by reactive ion etch to fabricate the designed structure.
In the characterization of this polarization beam splitter, we use a spectrometer to measure the transmission spectrum and calculate its diffraction efficiency. From the measured spectrum response, we can prove our design and analyze the fabrication error.
Subjects
極化分光器
次波長光柵
人工雙折射率
零階光柵
polarizing beam splitter
subwavelength grating
form-birefringent
zero-order grating
Type
thesis
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