The fabrication of silicon-based PZT microstructures using an aerosol deposition method
Journal
Journal of Micromechanics and Microengineering
Journal Volume
18
Journal Issue
5
Start Page
055034
Date Issued
2008
Author(s)
Abstract
This paper presents a series of processes for fabricating lead-zirconate-titanate (PZT) microstructures on a silicon substrate. An aerosol deposition method was used to deposit PZT thick film at room temperature. The low temperature deposition enabled a special lift-off process for patterning thick PZT films using a THB-151N photoresist. The milling rate of THB-151N by PZT particles was found to be the same as the PZT deposition rate of 5 μm h−1. Using this patterning technique, complex configurations of PZT microstructures have been demonstrated. Suspended multi-layer PZT microstructures have also been realized in this work.
Description
Article number 055034
Type
journal article