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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Study of etching bias modeling and correction strategies for patterning processes
Details
Study of etching bias modeling and correction strategies for patterning processes
Journal
38th International Micro & Nano Engineering Conference (MNE 2012)
Pages
P071-559
Date Issued
2012-09
Author(s)
Philip C.W. Ng
Kuen-Yu Tsai
Lawrence S. Melvin III
KUEN-YU TSAI
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/374085
Type
conference paper