Evolution of Vacancy Supersaturation in Relation to Electromigration in Thin Film Metallization

Resource

CHINESE JOURNAL OF PHYSICS, VOL. l2, NO. 2

Journal

CHINESE JOURNAL OF PHYSICS

Journal Volume

VOL. l2

Journal Issue

NO. 2

Pages

-

Date Issued

1974-10

Date

1974-10

Author(s)

Huang, Huei-Li

Chaug, Yi-Shung

DOI

20060927120030882243

URI

Publisher

臺北市:國立臺灣大學物理系所

Type

journal article

File(s)

Name

61.pdf

Size

237.98 KB

Format

Adobe PDF

Checksum

(MD5):373de13501fae134ccf6fef2d038e7aa