Design and Fabrication of One-step Nanoimprinting Mold for Nanowriter Optical head
Date Issued
2005
Date
2005
Author(s)
Lee, Jenn-Wei
DOI
zh-TW
Abstract
It has been verified that dielectric optical head can produce an enhanced and confined emitted light as that of the metallic optical head published previously under the new physical phenomena-Extraordinary transmission and directional beaming phenomena. In view of the limitation in fabricating nano-scaled metallic structure, nanoimprint lithography (NIL) will provide an excellent way for low-cost mass production. The imprint polymers such as thermosetting and light- cured ones have physical properties similar to that of dielectrics needed in ambient conditions. That is, these polymers that possess refractive index between 1.4 and 1.7 are just the materials needed to fabricate the dielectric optical head.
The surface structure of dielectric optical head has been manufactured by directly imprinting dielectric grating onto the polymer layer, which was spun-coated on metallic thin film. This dielectric optical head, which was fabricated by using the two-dimensional (single-layer) mold, only needs to etch a slit by using focused ion beam (FIB) to complete the fabrication. To further ease the production process, three-dimensional (double-layer) imprint mold has also been developed for the first time to form initial slit and grating pattern through one-step imprinting in this thesis. Using this improved method, we only need a few simple steps to fabricate the dielectric optical head without using the focused ion beam process. All in all, this newly developed imprinting method can meet the purposes of high-volume production and low cost simultaneously.
Nanoimprint is a quite important technology in developing the fabrication of dielectric optical head. The imprinting mold fabricated processes and dielectric optical head manufactured method developed during the course of this thesis have great potential for mass production. That is, this newly developed process has the potential to increase the commercial value of dielectric optical head for various applications include that of the nanowriter project.
The surface structure of dielectric optical head has been manufactured by directly imprinting dielectric grating onto the polymer layer, which was spun-coated on metallic thin film. This dielectric optical head, which was fabricated by using the two-dimensional (single-layer) mold, only needs to etch a slit by using focused ion beam (FIB) to complete the fabrication. To further ease the production process, three-dimensional (double-layer) imprint mold has also been developed for the first time to form initial slit and grating pattern through one-step imprinting in this thesis. Using this improved method, we only need a few simple steps to fabricate the dielectric optical head without using the focused ion beam process. All in all, this newly developed imprinting method can meet the purposes of high-volume production and low cost simultaneously.
Nanoimprint is a quite important technology in developing the fabrication of dielectric optical head. The imprinting mold fabricated processes and dielectric optical head manufactured method developed during the course of this thesis have great potential for mass production. That is, this newly developed process has the potential to increase the commercial value of dielectric optical head for various applications include that of the nanowriter project.
Subjects
奈米壓印
三維多層壓印模具
nanoimprint
3-dimension imprinting mold
Type
thesis
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