CHARACTERISTICS OF NATURAL ORGANIC MATTER DEGRADATION IN WATER BY UV/H2 O2 TREATMENT
Resource
ENVIRONMENTAL TECHNOLOGY v.27 n.3 pp.277-287
Journal
ENVIRONMENTAL TECHNOLOGY
Journal Volume
v.27
Journal Issue
n.3
Pages
277-287
Date Issued
2006
Date
2006
Author(s)
WANG, GEN-SHUH
Abstract
This study evaluated the UV/H2O2 system for degradation of natural organic matter in water. The photolysis experiments were conducted in a 10-1 batch reactor using a 450-watt high -pressure mercury vapor lamp as the light source. The addition of H2O2 in water greatly improved the rate of humic acid degradation by UV light and 90% of the humic acid was removed within 30 min of photolysis. Kinetic data showed that the first-order reaction could be used to describe the kinetics of both humic acid oxidation and H2O2 decomposition , and the optimum H2O2 dose was 0.01%similar to 0.05% for humic acid oxidation. It was also observed that the absorption of UVC (UV with wavelength between 200 and 280 nm ) is responsible for the dissociation of H2O2 to generate the reactive hydroxyl radicals. Depending on the initial dosages, the H2O2 added to the system can be completely decomposed by UV within 50 to 90 minutes. Upon UV irradiation, the humic intermediates with smaller molecular sizes increase as a result of the degradation of larger humic substances. Photolysis of surface water also shows that the UV/H2O2 was effective in reducing trihalomethanes ( THMs) formation in treating surface water with high contents of organic precursors. The distribution of THMs shifted from chlorine-THMs to bromine-THMs after UV/H2O2 treatments when bromide was present in water. However, higher H2O2 dosages would be necessary for the photolysis of surface water containing high concentrations of organic THM precursors. As observed from the Fourier transform infrared (FTIR) spectra, the functional groups of treated humic acids were destructed significantly, including -OH (from - COOH and -COH), aromatic -C=C, and -C=O conjugated with aromatic rings.
Subjects
humic acid
ultraviolet light (UV)
hydrogen peroxide (H2O2)
advanced oxidation process (AOP)
trihalomethane formation potential (THMFP)
Type
journal article