子計畫三：奈米壓印之印器與壓印系統
Date Issued
2005-07-31
Date
2005-07-31
Author(s)
黃榮山
DOI
932218E002015
Abstract
The project is aimed at developing the
mold fabrication and the imprinting recipe
for nano-imprint (NIL). For fabrication of a
nano-imprinting mold, the electron beam
lithography and ICP(Inductively Coupled
Plasma) dry etching will be mainly employed
to structure the mold of high aspect ratio.
As for the nano-imprinting process, the
hot-embossing will be employed, and the
molds will be tested to form the nanopatterns,
and then replicate the pattern to the polymer
on the substrate.
Subjects
Nanoimprint
Hot-embossing
Electron beam
Mold
Publisher
臺北市：國立臺灣大學應用力學研究所
Type
report
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