The effect of TiO2 film on the surface roughness and optical properties of Mo/Si periodic films by atomic layer deposition
Part Of
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
13215
Start Page
50
ISBN (of the container)
978-151068155-2
Date Issued
2024-11-12
Author(s)
Chao-Te Lee
Wen-Hao Cho
Wei-Chun Chen
Bor-Yuan Shew
Hung-Pin Chen
Cheng-Chung Jaing
Chien-Lin Lee
Editor(s)
Joern-Holger Franke
Kurt G. Ronse
Paolo A. Gargini
Patrick P. Naulleau
Toshiro Itani
Abstract
In this work, the TiO2 film was deposited on periodic Mo/Si bilayer at various temperatures (70~90°C) by atomic layer deposition (ALD). The H2O and Tetrakis(dimethylamino)titanium (TDMAT) were be used for precursors. Effects of substrate temperature and thickness of TiO2 film on the microstructure, surface roughness, and optical properties were investigated by field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), high resolution transmission electron microscope (HRTEM), and extreme ultraviolet (EUV) spectrometer, respectively. It was found that the surface roughness of the TiO2 film at substrate temperature 70°C was obviously larger than the others. The surface roughness of TiO2 film was under 0.2nm at the substrate temperature was above 80°C. The reflectivity of periodic Mo/Si bilayer was 66% by EUV spectrometer. We found that the reflectivity of Mo/Si/TiO2 films was decreased with increased the thickness of TiO2 film. The reflectivity of the films was maintain 65.97% as the TiO2 film was 1.8nm. However, the reflectivity of the films was decreased to 59.27% when the TiO2 film was 3nm. Based on the results of the reflectivity investigation, the TiO2 thin film by ALD as the protective film for highly reflective EUV mirror was been confirmed.
Event(s)
International Conference on Extreme Ultraviolet Lithography 2024
SDGs
Publisher
SPIE
Type
conference paper