New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints

Journal

Journal of Micro/Nanolithography, MEMS, and MOEMS

Journal Volume

11

Journal Issue

3

Pages

033007

Date Issued

2012-09

Author(s)

Hoi-Tou Ng

Yu-Tian Shen

Sheng-Yung Chen

Chun-Hung Liu

Philip C. W. Ng

Kuen-Yu Tsai

DOI

URI

Type

journal article