Nano-machining technique on quartz and its application to nanoimprint lithography
Date Issued
2005
Date
2005
Author(s)
Lee, Ying-Chun
DOI
zh-TW
Abstract
Quartz has much potential to be developed as device because of its material properties including piezoelectricity, isolation, transparent, high hardness, and high thermal stability. The major obstacle to develop MEMS and NEMS technique on quartz is the machining difficulty and the charging problem resulted from isolation in e-beam exposure process.
The latest and greatly-respected application of quartz is the mold in nanoimprint lithography technology (NIL). NIL differs from the traditional lithography in the process of exposure and development, which is replaced by the process that resist on substrate is imprinted by patterned mold. It is a high-throughput technique of saving much process time and cost.
This research utilizes conducting polymer Espacer300 as conducting layer to dissipate charging effect. After E-beam lithography, quartz mold is fabricated by metal evaporation, lift-off, and reactive ion etch. Photo-solidification NIL is accomplished with the surface-treated mold.
This research has completed 100 nm width e-beam lithography, 200nm width metal mask, 500 nm width mold and photo-solidification NIL.
Subjects
石英
母模
電子束微影
奈米壓印
光固化型奈米壓印
quartz
mold
e-beam lithography
nanoimprint
photo-solidification NIL
Type
thesis
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