Nanoparticle-assisted growth of porous germanium thin films
Journal
Advanced Materials
Journal Volume
16
Journal Issue
13
Pages
1121-1124
Date Issued
2004
Author(s)
Abstract
Porous Ge thin films (see Figure) have been prepared using low-pressure, inductively coupled plasma chemical vapor deposition. Au nanoparticles are used as catalysts to initiate the protrusion of Ge nanotips from the surface of the substrate. After removing the catalysts during growth, the Ge nanotips coalesce together to develop the porous structure. Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2004/c6541_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Type
journal article