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College of Science / 理學院
Applied Physics / 應用物理研究所
Inversion n-channel GaN MOSFETs with atomic-layer-deposited A1 2 O 3 as gate dielectrics
Details
Inversion n-channel GaN MOSFETs with atomic-layer-deposited A1 2 O 3 as gate dielectrics
Journal
2008 Device Research Conference
Date Issued
2008
Author(s)
Chang, YC
Chang, WH
Chiu, HC
Shiu, KH
Lee, CH
MINGHWEI HONG
Kwo, J
Hong, JM
Tsai, CC
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/340121
Type
book part