Contribution of enhanced ionization to the optoelectronic properties of p-type NiO films deposited by high power impulse magnetron sputtering

Journal

Journal of the European Ceramic Society

Journal Volume

39

Journal Issue

16

Pages

5285-5291

Date Issued

2019

Author(s)

Sun H.

Kuo T.-Y.

Chen S.-C.

Chen Y.-H.

Lin H.-C.

Arab Pour Yazdi M.

Billard A.

DOI

10.1016/j.jeurceramsoc.2019.08.008

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85070925795&doi=10.1016%2fj.jeurceramsoc.2019.08.008&partnerID=40&md5=67d5be006945c3cb7dbf8949c3a335c7

https://scholars.lib.ntu.edu.tw/handle/123456789/432402

Publisher

Elsevier Ltd

Type

journal article