Using an SU-8 photoresist structure and cytochrome c thin film sensing material for a microbolometer
Journal
Sensors (Switzerland)
Journal Volume
12
Journal Issue
12
Pages
16390-16403
Date Issued
2012
Author(s)
Abstract
There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10-8 V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 105 V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment. © 2012 by the authors; licensee MDPI, Basel, Switzerland.
Subjects
Cytochrome c; Exposure dose method; Microbolometer; SU-8; Temperature coefficient of resistance (TCR)
SDGs
Other Subjects
Cytochrome c; Exposure dose; Microbolometer; SU-8; Temperature coefficient of resistance; Bolometers; Proteins; Temperature sensors; Thermal conductivity; X ray lithography; Photoresists; cytochrome c; epoxide; polymer; SU 8 compound; SU-8 compound; article; chemistry; infrared radiation; surface property; Cytochromes c; Epoxy Compounds; Infrared Rays; Polymers; Surface Properties
Type
journal article