In-situ Monitoring of Silicon Membrane Thickness during Wet Etching Using a SAW Sensor
Resource
Japanese Journal of Applied Physics 43 (6A): 3611-3617
Journal
Japanese Journal of Applied Physics
Journal Issue
43
Pages
3611-3617
Date Issued
2004
Date
2004
Author(s)
Lee, Chi-Yuan
Chen, Yung-Yu
Chen, Wen-Jong
Pao, Shih-Yung
Type
journal article