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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
A Bilayer Film Design as Bottom Antireflective Coating for KrF, ArF and F
2
Lithographies
Details
A Bilayer Film Design as Bottom Antireflective Coating for KrF, ArF and F
2
Lithographies
Journal
Optics and Photonics Taiwan'02
Date Issued
2002-01
Author(s)
Y. R. Lu
C. H. Lin
L. A. Wang
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/299277
Type
conference paper