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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
Details
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
Journal
Proc. SPIE, Data Analysis and Modeling for Process Control II
Pages
61550A
Date Issued
2006-03
Author(s)
Arthur Tay
Weng-Khuen Ho
Ni Hu
Kuen-Yu Tsai
Ying Zhou
KUEN-YU TSAI
DOI
10.1117/12.654741
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/325532
Type
conference paper
