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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Printing 65nm Dense Lines by Using Phase Masks at 157nm Wavelength
Details
Printing 65nm Dense Lines by Using Phase Masks at 157nm Wavelength
Journal
The Third International Symposium on 157 nm Lithography
Date Issued
2002-01
Author(s)
L. A. Wang
W. C. Cheng
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/299272
Description
Antwerp
Type
conference paper
