A Single-run Single-mask ICP-RIE Process for Fabricating Suspended High-Aspect-Ratio MEMS Structures
Resource
Japanese Journal of Applied Physics,45(1A),305-310.
Journal
Japanese Journal of Applied Physics
Journal Volume
45
Journal Issue
1a
Pages
305-310
Date Issued
2006-01
Date
2006-01
Author(s)
Yang, Y.-J.
Fan, K.-C.
Kuo, W.-C.
Type
journal article