High-�e HfO2/TiO2/HfO2 multilayer quantum well flash memory devices
Journal
International Symposium on VLSI Technology, Systems, and Applications, Proceedings
Date Issued
2007
Author(s)
Maikap, S.
Tzeng, P.J.
Tseng, S.S.
Wang, T.-Y.
Lin, C.H.
Lee, H.Y.
Wang, C.C.
Tien, T.C.
Lee, L.S.
Li, P.W.
Yang, J.-R.
Tsai, M.-J.
Type
conference paper