Process Dependency of Radiation Hardness of Rapid Thermal Reoxidized Nitrided Gate Oxides

Journal

IEEE Transactions on Electron Devices

Journal Volume

40

Journal Issue

9

Pages

1597-1603

Date Issued

1993

Author(s)

DOI

10.1109/16.231564

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0027656851&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/301816

SDGs

[SDGs]SDG6

Type

journal article