High photosensitivity and broad spectral response of multi-layered germanium sulfide transistors
Journal
Nanoscale
Journal Volume
8
Journal Issue
4
Pages
2284-2292
Date Issued
2016
Author(s)
Ulaganathan, R. K.
Lu, Y. Y.
Kuo, C. J.
Tamalampudi, S. R.
Sankar, R.
Boopathi, K. M.
Anand, A.
Yadav, K.
Mathew, R. J.
Liu, C. R.
Abstract
In this paper, we report the optoelectronic properties of multi-layered GeS nanosheet (∼28 nm thick)-based field-effect transistors (called GeS-FETs). The multi-layered GeS-FETs exhibit remarkably high photoresponsivity of Rλ ∼ 206 A W(-1) under 1.5 μW cm(-2) illumination at λ = 633 nm, Vg = 0 V, and Vds = 10 V. The obtained Rλ ∼ 206 A W(-1) is excellent as compared with a GeS nanoribbon-based and the other family members of group IV-VI-based photodetectors in the layered-materials realm, such as GeSe and SnS2. The gate-dependent photoresponsivity of GeS-FETs was further measured to be able to reach Rλ ∼ 655 A W(-1) operated at Vg = -80 V. Moreover, the multi-layered GeS photodetector holds high external quantum efficiency (EQE ∼ 4.0 × 10(4)%) and specific detectivity (D* ∼ 2.35 × 10(13) Jones). The measured D* is comparable to those of the advanced commercial Si- and InGaAs-based photodiodes. The GeS photodetector also shows an excellent long-term photoswitching stability over a long period of operation (>1 h). These extraordinary properties of high photocurrent generation, broad spectral range, and long-term stability make the GeS-FET photodetector a highly qualified candidate for future optoelectronic applications.
SDGs
Publisher
Royal Society of Chemistry
Type
journal article