Preparation and characterization of TiO2 photocatalyst thin films using radio frequency sputtering
Journal
Journal of Computational and Theoretical Nanoscience
Journal Volume
13
Journal Issue
1
Pages
982-988
Date Issued
2016
Author(s)
Abstract
Photocatalytic titanium dioxide (TiO2) thin films with an anatase crystal structure are prepared by means of radio frequency (rf) magnetron sputtering. Deposition occurs on unheated soda-lime glass substrates. The target is undoped TiO2 ceramic oxide of 50.8 mm in diameter, argon is the plasma gas and oxygen is the reactive gas. The (101), (103), (112) and (200) peaks of the anatase crystal phase are observed at 2θ ∼25.7°, 36.1°, 38.7° and 47.3°, respectively. This effect of rf power (in the range from 180 to 210 W) and process pressure (in the range from 0.93 to 1.2 Pa), with an oxygen flow ratio [O2/(Ar+O2°] of 30%, on the structural properties, surface morphology and photocatalytic activity of the TiO2 thin films is studied. After annealing treatment, the TiO2 film exhibits a superhydrophilic surface and high photocatalytic activity. The surface of the aged sample that is stored in a dark box for 50 days also induces extremely hydrophobic functional groups (water contact angle of 102°). When the film surface is irradiated by UV light, the water contact angle begins to decrease, after 8 min of UV irradiation in air at approximately 70°. It is found that the film surface of the sample aged in a dark box, which is produced by oxygen plasma etching, recovers its hydrophilic properties and anatase crystal quality.
Type
journal article