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College of Science / 理學院
Physics / 物理學系
Ga2O3(Gd2O3) on Ge without interfacial layers: Energy-band parameters and metal oxide semiconductor devices
Details
Ga2O3(Gd2O3) on Ge without interfacial layers: Energy-band parameters and metal oxide semiconductor devices
Journal
Applied Physics Letters
Journal Volume
94
Journal Issue
20
Date Issued
2009
Author(s)
Chu, L.K.
Lin, T.D.
Huang, M.L.
Chu, R.L.
Chang, C.C.
Kwo, J.
MINGHWEI HONG
DOI
10.1063/1.3139772
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/443401
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-65949104293&doi=10.1063%2f1.3139772&partnerID=40&md5=ffce08f0b618b7760d4ae7892eea224c
Type
journal article